SDI101m_-_SP_2025_-_RE_3739.webp

Kizspy | Question: 10.
(Choose 1 answer)
MONS FLOW.JUM.
In the fabrication of a MOSFET, which of the following processes is used to create the gate oxide layer?
A. Ion implantation
B. Thermal oxidation
C. Chemical vapor deposition (CVD)
D. Etching